Guide: This article is about how to make thin film solar photovoltaic cells in the science solar light battery, and how to make it.

    What is a thin film solar photovoltaic cell?

    A typical crystalline silicon solar cell is fabricated on a high quality silicon wafer having a thickness of 350 to 450 m which is cut from a lifted or cast silicon. Therefore, more silicon material is actually consumed. In order to save materials, polycrystalline silicon films have been deposited on inexpensive substrates since the mid-1970s, but due to the small size of the grown silicon films, valuable solar cells have not been fabricated. In order to obtain a film of a large-sized grain, people have not stopped researching, and many methods have been proposed. Currently, polycrystalline silicon thin film solar cells are prepared.

    Chemical vapor deposition is used, including low pressure chemical vapor deposition and plasma enhanced chemical vapor deposition. In addition, liquid phase epitaxy and sputter deposition methods can also be used to prepare polycrystalline silicon thin film cells. Chemical vapor deposition is mainly carried out by using SH2Cl2, SiHAI, SiCl4 or SiH4 as reaction gases, and reacting under certain protective atmosphere to form silicon atoms and deposit them in heating. On the substrate, the substrate material is generally selected from S, S02, SuN, and the like. However, it has been found that it is difficult to form large crystal grains on a non-silicon substrate, and it is easy to form voids between the crystal grains. The solution to this problem is to first deposit a thin layer of amorphous silicon on the substrate by LPCVD, and then anneal the amorphous silicon layer to obtain larger crystal grains, and then in this layer of seed crystals. A thick polycrystalline silicon film is deposited on it. Therefore, recrystallization technology is undoubtedly an important link. The current technologies mainly include solid phase crystallization and medium melting recrystallization. In addition to the recrystallization process, polycrystalline silicon thin film solar cells use almost all technologies for preparing single crystal silicon solar cells, and the solar cell conversion efficiency thus obtained is remarkably improved.

    The conversion efficiency of the polycrystalline silicon battery produced by the Fleischberg Solar Research Institute in Germany using the zone melting recrystallization technology on the FZSi substrate is 19%. The Mitsubishi Corporation of Japan used this method to prepare the battery with a conversion efficiency of 16.42%. The principle of the liquid phase epitaxy method is to reduce the temperature of the silicon film by melting the silicon in the matrix. The conversion efficiency of batteries prepared by Astropower in the United States using LPE is 12.2%. Chen Zheliang of China Optoelectronics Development Technology Center used liquid phase epitaxy to grow silicon grains on metallurgical grade silicon wafers, and designed a new type of solar cell similar to crystalline silicon thin film solar cells, called "silicon grain" solar cells. However, reports on performance have not been seen. Polycrystalline silicon thin film solar cells are far less efficient than single crystal silicon, and have no efficiency degradation problem, and may be prepared on inexpensive substrate materials, which is much lower in cost than single crystal silicon cells, and higher in efficiency than amorphous silicon. Thin film solar cells, therefore, polycrystalline silicon thin film batteries will soon dominate the solar cell market

    The production method and development of solar light thin film solar photovoltaic cells are as above. The batteries of solar lights also have their own advantages. Nuusolar manufactures high quality solar lighting products for you.